Introduction

The Fraunhofer Institute for Integrated Systems and Device Technology (IISB), founded in 1985, is one of the 60 Fraunhofer Institutes. It conducts applied research and development in the fields of micro- and nanoelectronics, power electronics, and mechatronics. With its technology, device, and material development, its activities in the field of simulation as well as its works on power electronic systems for energy efficiency and hybrid and electric vehicles, the institute enjoys international attention and recognition.

With a staff of more than 150, research is carried out in close co-operation with industrial partners from large as well as small and medium-sized enterprises (SMEs). The equipment of the institute includes a vast variety of labs with all standard techniques of semiconductor processing, crystal growth and power electronics. Moreover, 1500m² of high class clean room area is available, creating a unique environment for R&D at industrial standards. The strength of IISB is the wide scope and expertise of the institute, with the field of semiconductor devices, processes, and equipment being framed by the production of substrate materials on one side, and complete microelectronic systems on the other side. Besides experimental expertise and state-of-the-art equipment, extensive activities in simulation, process control, metrology, analysis, and characterization ensure an all-round treatment of the research topics. The services of IISB include research and development, studies, technical consulting, services in measurement, testing and simulation, limited-lot production, project accomplishment, and initialization of co-operation.

Within the department of Semiconductor Manufacturing Equipment and Methods industrial companies are supported in assessing new manufacturing equipment, materials, and the related processes. Activities include specification, co-development, optimization, and assessment of equipment, development of processes and qualification of unstructured wafers, structured wafers, and devices. An additional research focus area is the development and application of novel in situ metrology and advanced process control methods. Members of the institute are active in and heading SEMI standardization taskforces and ITRS technical working groups.